Behind the Mask

Spiva Center for the Arts invites artists to submit work for a new exhibition exploring the tension between external appearances and internal truths. Behind the Mask challenges the audience to examine how we navigate the complex relationship between our public selves and our private identities. Whether literal, metaphorical, or psychological, the "mask" serves as a symbol of the roles we adopt, the facades we construct, and the truth we conceal. These do not need to be self-portraits.

The exhibition accepts all forms of portraiture, including painting, photography, mixed media, and sculpture. Portraits should explore the theme of masks—whether through symbolism, abstract representations, or direct depictions. Consider how your work might show the divide between outward appearances and inner emotions or truths. This is a juried exhibition, and selected work will be on display in Spiva's gallery for seven weeks (June 21 - August 9, 2025). Monetary prizes will be awarded for 1st, 2nd, and 3rd place winners.

Submissions must include high-quality images (at least 300 DPI) in JPEG or PNG format and a brief artist statement (200-300 words) explaining how your work addresses the theme and your creative process. Maximum dimensions for 2D artwork are 48" x 48"; sculpture should not exceed 6 ft in height or width. Accepted work must not be presented behind glass, unless hand-delivered. Entry fee is $40 for two works; additional entries are $10 each. Minimum two images required (the same work may be submitted twice). All entrants will be notified of acceptance or declination by May 5th. This exhibition is open to artists living and working in the United States or its territories. Submitted images must be the artist's own work, and artists are solely responsible for obtaining written releases from any recognizable persons depicted. All work must be original and never previously exhibited at George A. Spiva Center for the Arts. For questions, contact Shaun Conroy at [email protected].