2017 Wheaton Biennial: Printmaking Reimagined

Wheaton College invites artists to submit work for the 2017 Wheaton Biennial, which focuses on new directions in printmaking and examines what constitutes a print today, particularly in light of new technologies. The Biennial seeks work that reflects a spirit of inquiry and critical reflection on the boundaries of artistic media. Work by artists in all stages of their careers will be considered, and selections will be made by juror Andrew Raftery. The College is seeking a diverse range of experimental work that collectively evokes an open-ended reconsideration of the boundaries of printmaking.

Submissions must include 3-5 total work samples, which may consist of images, audio, or video files (up to 5 of each type). Entry fee is $25.00, with an additional $5.00 media fee for each image/file beyond 3. The application deadline is November 15, 2016 at 11:59 p.m. MST. The exhibition will be held at the Beard and Weil Galleries from March 1 to April 10, 2017.

Andrew Stein Raftery is a printmaker specializing in narrative scenes of contemporary American life, trained in painting and printmaking at Boston University and Yale. His work has been collected by the Whitney Museum of American Art, Metropolitan Museum of Art, Cleveland Museum of Art, Museum of Fine Arts Boston, and the British Museum. He received the Louis Comfort Tiffany Award in 2003 and was a fellow of the John Simon Guggenheim Memorial Foundation in 2008. He was elected to membership in the National Academy in 2009 and is Professor of Painting at Rhode Island School of Design.